KP300 Series

The compact KP300 Series pressure controller is designed for integration into equipment that requires stable, repeatable pressure control. Applications include wafer backside helium cooling, pressure control in liquid precursor delivery systems, and MOCVD vapor delivery.

Available Pressure Ranges: 0–50 or 0–100 Torr
Pressure Control Accuracy: ±0.5%F.S.
Control Span: 1–100% of full scale
Response Time: ≤1s

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Configuration and suitability confirmed for your application.

Pressure Control Parameters

Available Pressure Ranges	0–50 or 0–100 Torr
Pressure Control Accuracy	±0.5%F.S.
Control Span	1–100% of full scale
Response Time	≤1s

Flow Detection Parameters

Flow Measurement Range (Ammonia)	0~20/50/100 sccm (please contact us for others)
Flow Detection Accuracy	0~25%F.S.: <0.3%F.S. >25%F.S.: 1%RD

Leak Rate

External Leak Rate	≤1×10⁻¹² Pa·m³/s (nitrogen)
Internal Leak Rate	<0.1 sccm (nitrogen)

Electrical Parameters

Power Supply	18~32V (24V recommended)
Pressure Signal Output	0~10V
Flow Signal Output	0~5V

Communication Interface

Communication

RS485, EtherCAT, DeviceNet

Mechanical Parameters

Connector Type	1/4 VCR
Inlet Pressure Range	1.5~3 bar

Environmental Conditions

Operating Temperature

15~40℃

Measurement conditions & notes

KP300 Series features ultra-compact size, suitable for system integration.
Cost-effective solution with high precision and high resolution.
Suitable for semiconductor wafer helium cooling system, liquid source pressure control system, MOCVD vapor pressure control.

Confirm fluid compatibility, materials, connections, and available configuration with our team before ordering.